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Cryo Plasma Etching Takachi ICP Cryo

We would like to introduce the etching equipment for ultra-low temperature environments that we handle.

We would like to introduce the "Takachi ICP Cryo," which we handle. It is used in etching processes that require higher anisotropy and selectivity. 【Features】 ■ Temperature range: -150℃ to +350℃ ■ Wafer size: 2" to 8" * You can download the English version of the catalog. * For more details, please refer to the PDF document or feel free to contact us.

• Company：プラズマ・サーモ・ジャパン
• Price：Other

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